OZONE - Hot Wire(Catalytic) Chemical Vapor Deposition

OZONE has been used to deposit high quality of poly & amorphous silicon film at low substrate temperature. It offers a low risk manufacturing solution, high profit via high productivity to customer.

Application

• Mainly, Poly silicon films for flat panel display, amorphous silicon solar cells, diamond like carbon coating, carbon nano tube growth, AM-OLED

Technology

• Unique gas shower head design for film uniformity
  
• Designed for large area deposition
  
• High process productivity
  
• Filament design for long life & easy maintenance
  

Specification

• 1 process chamber
  
• 1 load lock chamber with standard wafer magazines
  
• Linear sample transfer
  
• Substrate dimensions up to 370mm x 400mm
  
• Substrate heating max. 1,000°C
  
• Turbo molecular pump of high-vacuum pumping
  
• Auto pressure control with throttle valve
  
• Gas delivery module with mass flow controller
  
• Manual / PC, PLC control including Windows user interface for fully automatic process control